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1

Reliability of ultrathin gate oxides for ULSI devices

Chun-Yen Chang, Chi-Chun Chen, Horng-Chih Lin, Mong-Song Liang, Chao-Hsin Chien, Tiao-Yuan Huang

Journal:

Microelectronics Reliability

Year:

1999

Language:

english

File:

PDF, 251 KB

english, 1999

2

Diffusion of Copper in Titanium Zirconium Nitride Thin Films

Kuo, Yu-Lin, Lee, Hsin-Hung, Lee, Chiapyng, Lin, Jing-Cheng, Shue, Shau-Lin, Liang, Mong-Song, Daniels, Brian J.

Journal:

Electrochemical and Solid-State Letters

Year:

2004

Language:

english

File:

PDF, 70 KB

english, 2004

3

Plasma-induced charging damage in ultrathin (3-nm) gate oxides

Chi-Chun Chen, Horng-Chih Lin, Chun-Yen Chang, Mong-Song Liang, Chao-Hsin Chien, Szu-Kang Hsien, Tiao-Yuan Huang, Tien-Sheng Chao

Journal:

IEEE Transactions on Electron Devices

Year:

2000

Language:

english

File:

PDF, 153 KB

english, 2000

4

MOSFET degradation due to stressing of thin oxide

Mong-Song Liang, Chi Chang, Yew Tong Yeow, Chenming Hu, Brodersen, R.W.

Journal:

IEEE Transactions on Electron Devices

Year:

1984

Language:

english

File:

PDF, 689 KB

english, 1984

5

[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - 35 nm CMOS FinFETs

Fu-Liang Yang,, Haur-Ywh Chen,, Fang-Cheng Chen,, Yi-Lin Chan,, Kuo-Nan Yang,, Chih-Jian Chen,, Hun-Jan Tao,, Yang-Kyu Choi,, Mong-Song Liang,, Chenming Hu,

Year:

2002

Language:

english

File:

PDF, 301 KB

english, 2002

6

[IRE 1981 International Electron Devices Meeting - ()] 1981 International Electron Devices Meeting - Electron trapping in very thin thermal silicon dioxides

Mong-Song Liang,, Chenming Hu,

Year:

1981

Language:

english

File:

PDF, 285 KB

english, 1981

7

[IEEE IEEE International Interconnect Technology Conference - Burlingame, CA, USA (2-4 June 2003)] Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695) - Leakage and breakdown mechanisms in Cu damascene with a bilayer-structured α-SiCN/α-SiC dielectric barrier

Chiu-Chih Chiang,, I-Hsiu Ko,, Mao-Chieh Chen,, Zhen-Cheng Wu,, Yung-Cheng Lu,, Syun-Ming Jang,, Mong-Song Liang,

Year:

2003

Language:

english

File:

PDF, 252 KB

english, 2003

8

Leakage mechanism in Cu damascene structure with methylsilane-doped low-K CVD oxide as intermetal dielectric

Zhen-Cheng Wu,, Chiu-Chih Chiang,, Wei-Hao Wu,, Mao-Chieh Chen,, Shwang-Ming Jeng,, Lain-Jong Li,, Syun-Ming Jang,, Chen-Hua Yu,, Mong-Song Liang,

Journal:

IEEE Electron Device Letters

Year:

2001

Language:

english

File:

PDF, 234 KB

english, 2001

9

[IEEE IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004. - San Francisco, CA, USA (Dec. 13-15, 2004)] IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004. - Challenges in Cu/low-K integration

Mong-Song Liang,

Year:

2004

Language:

english

File:

PDF, 355 KB

english, 2004

10

[IEEE Proceedings of the IEEE 2004 International Interconnect Technology Conference - Burlingame, CA, USA (7-9 June 2004)] Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729) - BEOL process integration of 65nm Cu/low k interconnects

Jeng, C.C., Wan, W.K., Lin, H.H., Ming-Shuo Liang,, Tang, K.H., Kao, I.C., Lo, H.C., Chi, K.S., Huang, T.C., Yao, C.H., Lin, C.C., Lei, M.D., Hsia, C.C., Mong-Song Liang,

Year:

2004

Language:

english

File:

PDF, 346 KB

english, 2004

11

[IEEE Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Kyoto, Japan (June 14-16, 2005)] Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Reliability of HfSiON as gate dielectric for advanced CMOS technology

Wang, H.C.-H., Ching-Wei Tsai,, Shang-Jr Chen,, Chien-Tai Chan,, Huan-Just Lin,, Ying Jin,, Hun-Jan Tao,, Shih-Chang Chen,, Diaz, C.H., Tongchern Ong,, Oates, A.S., Mong-Song Liang,, Min-hwa

Year:

2005

Language:

english

File:

PDF, 486 KB

english, 2005

12

Improved immunity to plasma damage in ultrathin nitrided oxides [CMOS technology]

Chi-Chun Chen,, Horng-Chih Lin,, Chun-Yen Chang,, Mong-Song Liang,, Chao-Hsin Chien,, Szu-Kang Hsien,, Tiao-Yuan Huang,

Journal:

IEEE Electron Device Letters

Year:

2000

Language:

english

File:

PDF, 65 KB

english, 2000

13

Improvement of thin-gate oxide integrity using through-silicon-gate nitrogen ion implantation

Haddad, S., Mong-Song Liang,

Journal:

IEEE Electron Device Letters

Year:

1987

Language:

english

File:

PDF, 329 KB

english, 1987

14

[American Vacuum Soc 2002 7th International Symposium on Plasma- and Process-Induced Damage - Maui, HI, USA (5-7 June 2002)] 7th International Symposium on Plasma- and Process-Induced Damage - Plasma damage reduction for high density plasma CVD phosphosilicate glass process

Sunway Chen,, Chu-Yun Fu,, Syun-Ming Jang,, Chen-Hua Yu,, Mong-Song Liang,

Year:

2002

Language:

english

File:

PDF, 175 KB

english, 2002

15

[IEEE 2006 International Electron Devices Meeting - San Francisco, CA, USA (2006.12.11-2006.12.13)] 2006 International Electron Devices Meeting - High-Performance PMOS Devices on (110)/ Substrate/Channel with Multiple Stressors

Wang, Howard C.-H., Huang, Shih-Hian, Tsai, Ching-Wei, Lin, Hsien-Hsin, Lee, Tze-Liang, Chen, Shih-Chang, Diaz, Carlos H., Liang, Mong-Song, Sun, Jack Y.-C.

Year:

2006

Language:

english

File:

PDF, 285 KB

english, 2006

16

Physical and Barrier Properties of Amorphous Silicon-Oxycarbide Deposited by PECVD from Octamethylcyclotetrasiloxane

Chiang, Chiu-Chih, Chen, Mao-Chieh, Li, Lain-Jong, Wu, Zhen-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Year:

2004

Language:

english

File:

PDF, 185 KB

english, 2004

17

Implantation Induced Defects in the Retrograde Well with a Buried Layer

Hsu, Wei-Cheng, Liang, Mong-Song, Chen, Mao-Chieh

Journal:

Journal of The Electrochemical Society

Year:

2002

Language:

english

File:

PDF, 727 KB

english, 2002

18

Mechanical property analyses of porous low-dielectric-constant films for stability evaluation of multilevel-interconnect structures

Shou-Yi Chang, Hui-Lin Chang, Yung-Cheng Lu, Syun-Ming Jang, Su-Jien Lin, Mong-Song Liang

Journal:

Thin Solid Films

Year:

2004

Language:

english

File:

PDF, 636 KB

english, 2004

19

Properties and thermal stability of porous organic low-dielectric-constant materials

Shou-Yi Chang, Syun-Ming Jang, Su-Jien Lin, Mong-Song Liang

Journal:

Thin Solid Films

Year:

2004

Language:

english

File:

PDF, 498 KB

english, 2004

20

A novel programming technique for highly scalable and disturbance immune flash EEPROM

Kuo-Ching Huang, Yean-Kuen Fang, Dun-Nian Yaung, Chung-Hui Chen, Yung-Lung Hsu, Shyh-Fann Ting, Yvonne Lin, Di-son Kuo, Chung S. Wang, Mong-Song Liang

Journal:

Solid-State Electronics

Year:

2001

Language:

english

File:

PDF, 195 KB

english, 2001

21

A novel technique for profiling the lateral n- doping concentrations of submicron LDD MOS devices

Chung, S.S., Shui-Ming Cheng, Lee, R.G.-H., Song-Nian Kuo, Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

1997

Language:

english

File:

PDF, 216 KB

english, 1997

22

A new technique for hot carrier reliability evaluations of flash memory cell after long-term program/erase cycles

Chung, S.S., Cherng-Ming Yih, Shui-Ming Cheng, Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

1999

Language:

english

File:

PDF, 226 KB

english, 1999

23

Characterization of hot-hole injection induced SILC and related disturbs in flash memories

Cherng-Ming Yih, Zhi-Hao Ho, Mong-Song Liang, Chung, S.S.

Journal:

IEEE Transactions on Electron Devices

Year:

2001

Language:

english

File:

PDF, 130 KB

english, 2001

24

A trap generation closed-form statistical model for intrinsic oxide breakdown

Huan-Tsung Huang, Ming-Jer Chen, Chi-Wen Su, Jyh-Huei Chen, Chin-Shan Hou, Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

2001

Language:

english

File:

PDF, 122 KB

english, 2001

25

To optimize electrical properties of the ultrathin (1.6 nm) nitride/oxide gate stacks with bottom oxide materials and post-deposition treatment

Chein-Hao Chen, Yean-Kuen Fang, Chih-Wei Yang, Shyh-Fann Ting, Yong-Shiuan Tsair, Ming-Fang Wang, Tuo-Hong Hou, Mo-Chiun Yu, Shih-Chang Chen, Jang, S.M., Yu, D.C.H., Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

2001

Language:

english

File:

PDF, 192 KB

english, 2001

26

Edge hole direct tunneling leakage in ultrathin gate oxide p-channel MOSFETs

Kuo-Nan Yang, Huan-Tsung Huang, Ming-Jer Chen, Yeou-Ming Lin, Mo-Chiun Yu, Jang, S.S.A., Yu, D.C.H., Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

2001

Language:

english

File:

PDF, 153 KB

english, 2001

27

Downscaling limit of equivalent oxide thickness in formation of ultrathin gate dielectric by thermal-enhanced remote plasma nitridation

Chien-Hao Chen, Yean-Kuen Fang, Shyh-Fann Ting, Wen-Tse Hsieh, Chih-Wei Yang, Tzu-Hsuan Hsu, Mo-Chiun Yu, Tze-Liang Lee, Shih-Chang Chen, Chen-Hua Yu, Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

2002

Language:

english

File:

PDF, 321 KB

english, 2002

28

IIB-2 direct tunneling in thin gate-oxide MOS structure

Chi Chang, Brodersen, R.W., Mong-Song Liang, Chenwing Hu

Journal:

IEEE Transactions on Electron Devices

Year:

1983

Language:

english

File:

PDF, 199 KB

english, 1983

29

Inversion-layer capacitance and mobility of very thin gate-Oxide MOSFET's

Mong-Song Liang, Jeong Yeol Choi, Ping-Keung Ko, Chenming Hu

Journal:

IEEE Transactions on Electron Devices

Year:

1986

Language:

english

File:

PDF, 539 KB

english, 1986

30

High-Temperature Stable IrxSi Gates With High Work Function on HfSiON p-MOSFETs

B. F. Hung, C. H. Wu, Albert Chin, S. J. Wang, F. Y. Yen, Y. T. Hou, Y. Jin, H. J. Tao, Shih C. Chen, Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

2007

Language:

english

File:

PDF, 369 KB

english, 2007

31

Transient Charging and Discharging Behaviors of Border Traps in the Dual-Layer HfO2/SiO2 High- κ Gate Stack Observed by Using Low-Frequency Charge Pumping Method

Wei-Hao Wu, Bing-Yue Tsui, Mao-Chieh Chen, Yong-Tian Hou, Yin Jin, Tao, H.-J., Shih-Chang Chen, Mong-Song Liang

Journal:

IEEE Transactions on Electron Devices

Year:

2007

Language:

english

File:

PDF, 415 KB

english, 2007

32

Electrical Characteristics of Polymer Thick Film Resistors, Part I: Experiemental Results

Shen-Li Fu, Mong-Song Liang, Shiramatsu, T., Tien-Shou Wu

Journal:

IEEE Transactions on Components Hybrids and Manufacturing Technology

Year:

1981

Language:

english

File:

PDF, 700 KB

english, 1981

33

Effect of substrate bias on the performance and reliability of the split-gate source-side injected flash memory

Kuo-ching Huang, Yean-kuen Fang, Dun-nian Yaung, Chii-wen Chen, Hung-cheng Sung, Di-son Kuo, C. Wang, Mong-song Liang

Journal:

IEEE Electron Device Letters

Year:

1999

Language:

english

File:

PDF, 77 KB

english, 1999

34

Effects of O 2 - and N 2 -Plasma Treatments on Copper Surface

Chiang, Chiu-Chih, Chen, Mao-Chieh, Li, Lain-Jong, Wu, Zhen-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 206 KB

english, 2004

35

[IEEE Thermal and Thermomechanical 10th Intersociety Conference on Phenomena in Electronics Systems, 2006. ITHERM 2006. - San Diego, CA (May 30-June 2, 2006)] Thermal and Thermomechanical Proceedings 10th Intersociety Conference on Phenomena in Electronics Systems, 2006. ITHERM 2006. - Stability of J-integral calculation in the crack growth of copper/low-K stacked structures

Chang-Chun Lee,, Chien-Chia Chiu,, Kuo-Ning Chiang,, Tai-Chun Huang,, Chih-Hsiang Yao,, Chin-Chiu Hsia,, Mong-Song Liang,

Year:

2006

Language:

english

File:

PDF, 629 KB

english, 2006

36

The impacts of control gate voltage on the cycling endurance of split gate flash memory

Kuo-Ching Huang,, Yean-Kuen Fang,, Dun-Nian Yang,, Chii-Wen Chen,, Hung-Cheng Sung,, Di-Son Kuo,, Wang, C.S., Mong-Song Liang,

Journal:

IEEE Electron Device Letters

Year:

2000

Language:

english

File:

PDF, 66 KB

english, 2000

37

A hot-hole erasable memory cell

Mong-Song Liang,, Tien-Chiun Lee,

Journal:

IEEE Electron Device Letters

Year:

1986

Language:

english

File:

PDF, 358 KB

english, 1986

38

The electrostatic charging damage on the characteristics and reliability of polysilicon thin-film transistors during plasma hydrogenation

Kan-Yuan Lee,, Yean-Kuen Fang,, Chii-Wen Chen,, Huang, K.C., Mong-Song Liang,, Wuu, G.

Journal:

IEEE Electron Device Letters

Year:

1997

Language:

english

File:

PDF, 54 KB

english, 1997

39

Effects of different tungsten polycide process on the effective channel length and performance of deep submicron CMOS transistors

Kuo-Ching Huang,, Yean-Kuen Fang,, Dun-Nian Yaung,, Chii-Wen Chen,, Mong-Song Liang,, Jang-Cheng Hsieh,, Chi-Wen Su,, Kuei-Ying Lee,

Journal:

IEEE Electron Device Letters

Year:

1999

Language:

english

File:

PDF, 74 KB

english, 1999

40

[IEEE International Symposium on VLSI Technology Systems and Applications - Taipei, Taiwan (8-10 June 1999)] 1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453) - A trap generation statistical model in closed-form for intrinsic breakdown of ultra-thin oxides

Huan-Tsung Huang,, Ming-Jer Chen,, Jyh-Huei Chen,, Chi-Wen Su,, Chin-Shan Hou,, Mong-Song Liang,

Year:

1999

Language:

english

File:

PDF, 363 KB

english, 1999

41

Growth of (Ti,Zr)N Films on Si by DC Reactive Sputtering of TiZr in N[sub 2]/Ar Gas Mixtures

Kuo, Yu-Lin, Lee, Chiapyng, Lin, Jing-Cheng, Peng, Chao-Hsien, Chen, Li-Chien, Hsieh, Ching-Hua, Shue, Shau-Lin, Liang, Mong-Song, Daniels, Brian J., Huang, Cheng-Lin, Lai, Chih-Huang

Journal:

Journal of The Electrochemical Society

Year:

2004

Language:

english

File:

PDF, 311 KB

english, 2004

42

A novel stack structure to improve the degradation of W-polycide gated MOS device with undoped a-Si/heavily-doped poly-Si multilayer

Kan-Yuan Lee,, Yean-Kuen Fang,, Chii-Wen Chen,, Mong-Song Liang,, Jang-Cheng Hsieh,

Journal:

IEEE Electron Device Letters

Year:

1997

Language:

english

File:

PDF, 52 KB

english, 1997

43

[IRE 1986 International Electron Devices Meeting - ()] 1986 International Electron Devices Meeting - Degradation of very thin gate oxide MOS devices under dynamic high field/Current stress

Mong-Song Liang,, Haddad, S., Cox, W., Cagnina, S.

Year:

1986

Language:

english

File:

PDF, 511 KB

english, 1986

44

Characteristics of DC Reactively Sputtered (Ti,Zr)N Thin Films as Diffusion Barriers for Cu Metallization

Kuo, Yu-Lin, Lee, Chiapyng, Lin, Jing-Cheng, Peng, Chao-Hsien, Chen, Li-Chien, Hsieh, Ching-Hua, Shue, Shau-Lin, Liang, Mong-Song, Daniels, Brian J., Huang, Cheng-Lin, Lai, Chih-Huang

Journal:

Electrochemical and Solid-State Letters

Year:

2003

Language:

english

File:

PDF, 102 KB

english, 2003

45

Spatial and energetic distribution of border traps in the dual-layer HfO[sub 2]∕SiO[sub 2] high-k gate stack by low-frequency capacitance-voltage measurement

Wu, Wei-Hao, Tsui, Bing-Yue, Chen, Mao-Chieh, Hou, Yong-Tian, Jin, Yin, Tao, Hun-Jan, Chen, Shih-Chang, Liang, Mong-Song

Journal:

Applied Physics Letters

Year:

2006

Language:

english

File:

PDF, 460 KB

english, 2006

46

Cell-based analytic statistical model with correlated parameters for intrinsic breakdown of ultrathin oxides

Ming-Jer Chen,, Huan-Tsung Huang,, Jyh-Huei Chen,, Chi-Wen Su,, Chin-Shan Hou,, Mong-Song Liang,

Journal:

IEEE Electron Device Letters

Year:

1999

Language:

english

File:

PDF, 79 KB

english, 1999

47

[IEEE Proceedings of the IEEE 2006 International Interconnect Technology Conference - Burlingame, CA (2006.06.5-2006.06.7)] 2006 International Interconnect Technology Conference - Evaluation and Numerical Simulation of Optimal Structural Designs for Reliable Packaging of Ultra Low K Process Technology

Huang, T.C., Peng, C.T., Yao, C.H., Huang, C.H., Li, S.Y., Liang, M.S., Wang, Y.C., Wan, W.K., Lin, K.C., Hsia, C.C., Mong-Song Liang,

Year:

2006

Language:

english

File:

PDF, 856 KB

english, 2006

48

The nature of charge trapping responsible for thin-oxide breakdown under a dynamic field stress

Haddad, S., Mong-Song Liang,

Journal:

IEEE Electron Device Letters

Year:

1987

Language:

english

File:

PDF, 327 KB

english, 1987

49

[IEEE 2006 International Symposium on VLSI Technology, Systems, and Applications - Hsinchu, Taiwan (2006.4.24-2006.4.24)] 2006 International Symposium on VLSI Technology, Systems, and Applications - HfSiON Gate Dielectric for 45nm Node Low-Power Device

Gan, Tian-choy, Wang, Howard, Chen, Shang-jr, Tsai, Ching-wei, Lim, Peng-soon, Lin, Huan-just, Jin, Ying, Tao, Hun-jan, Chen, Shih-chang, Leung, Ying, Diaz, Carlos, Liang, Mong-song, Mii, Yuh-jier

Year:

2006

Language:

english

File:

PDF, 2.37 MB

english, 2006

50

Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Wu, Zhen-Cheng, Shiung, Zhi-Wen, Chiang, Chiu-Chih, Wu, Wei-Hao, Chen, Mao-Chieh, Jeng, Shwang-Ming, Chang, Weng, Chou, Pei-Fen, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Year:

2001

Language:

english

File:

PDF, 221 KB

english, 2001